| Optimization of Tungsten Dual Poly-Metal Gates in Memory Devices with Ti/WN/WSiN Barrier Metal | |||||
| 작성자 | 김** | 작성일 | 2018-08-02 | 조회수 | 114 |
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JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY
성민규,박성기,Ahmed Ali,Yongsoo Kim |
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